ALD System for Thin Film Deposition

No. 1 ALD system for atomic-scale thin film deposition BENEQ TFS500, dimensions 1,800 mm x 900 mm x 2,033 mm, temperature range 25-500 °C (machine intended for advanced research and industrial production in the microelectronics, photonics, sensor technology, functional coatings and nanotechnology sectors; it enables controlled, uniform and conformal nanometric depositions, even on complex and three-dimensional surfaces).

Make: Beneq

Model: TFS500